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Ultra-flat thermal SiO2 wafers, 200nm, type <100> stock Needle tip

SKU: 86348980390

4.0
USD216.00 USD239.00

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Ultra-flat thermal SiO2 wafers, 200nm, type <100> stock Needle tipThe Ultra Flat SiO2 substrates consist of a 200nm thermally grown amorphous SiO2 film on an ultra flat silicon wafer. SiO2 is one of the most characterised materials and is widely used in semiconductor manufacturing, thin film research and as substrate for growing cells. It can be directly used as substrate for AFM and SEM imaging. The ultra flat thermal silicon dioxide substrates are available in 6" wafer and conveniently diced 5 x 5mm, 5 x 7mm and

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Description

Needle tip

up to overnight also work well

lenses and delicate instruments

Back Surface: Etched

ranging from atmosphere to 0

Ultra-flat thermal SiO2 wafers, 200nm, type <100> stock Needle tipThe Ultra Flat SiO2 substrates consist of a 200nm thermally grown amorphous SiO2 film on an ultra flat silicon wafer. SiO2 is one of the most characterised materials and is widely used in semiconductor manufacturing, thin film research and as substrate for growing cells. It can be directly used as substrate for AFM and SEM imaging. The ultra flat thermal silicon dioxide substrates are available in 6" wafer and conveniently diced 5 x 5mm, 5 x 7mm and

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